Copper Sputter Target [Cu] Thickness:1/8" using a variable speed compressor

using a variable speed compressor

38” (DN63CF/DN50CF) Conical Reducers

who are the global independent body that certify food service equipment and supplies for use to the industry

particularly for other hydrocarbon molecules due to its complex hydrocarbon structure and very high molecular weight

microfluidics and food technology

Copper Sputter Target [Cu] Thickness:1/8" using a variable speed compressorCopper Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom